Reactive Ion Etcher System
Torr International Services LLC manufactures Reactive Ion Etchers designed for etching films of oxides, nitrides, polymers and more. Our standard RIE Series Plasma Etching System accommodates wafers/samples of up to 200mm diameter . Our custom RIE systems can handle variety of sample sizes based on geometry and research Needs.
Reactive Ion Etchers can be manually or PC controlled, and can be table-top or stand-alone cabinet systems.
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